Effect of binding energy and mass in cluster-induced sputtering of van-der-Waals bonded systems
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference21 articles.
1. Molecular dynamics simulation of thin film formation by energetic cluster impact (ECI)
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5. Computer simulation of crystal surface modification by accelerated cluster ion impacts
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1. Physical basis of energy per cluster atom in the universal concept of sputtering;Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena;2016-05
2. Seduction of Finding Universality in Sputtering Yields Due to Cluster Bombardment of Solids;Accounts of Chemical Research;2015-08-07
3. Preferential sputtering in phosphate glass systems for the processing of bioactive coatings;Thin Solid Films;2015-08
4. Sputtering and reflection of self-bombardment of tungsten material;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2015-04
5. On Universality in Sputtering Yields Due to Cluster Bombardment;The Journal of Physical Chemistry Letters;2014-09-08
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