Characteristics of Al doped zinc oxide (ZAO) thin films deposited by RF magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference13 articles.
1. Resistivity of polycrystalline zinc oxide films: current status and physical limit
2. Optical and electrical properties of ZnO films prepared by URT-IP method
3. Electrical and optical properties of ion beam sputtered ZnO:Al films as a function of film thickness
4. Properties of ZnO:In film prepared by sputtering of facing ZnO:In and Zn targets
5. Properties of Ga-doped ZnO films
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3. Influence of Substrate-Target Distance on Structural and Optical Properties of Ga and (Al + Ga)-doped ZnO Thin Films Deposited by Radio Frequency Sputtering;Analytical Letters;2019-04-25
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5. Characterization of the Aluminum Concentration upon the Properties of Aluminum Zinc Oxide Thin Films;Analytical Letters;2015-11-09
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