Influence of Substrate-Target Distance on Structural and Optical Properties of Ga and (Al + Ga)-doped ZnO Thin Films Deposited by Radio Frequency Sputtering-Reference-Cited by-同舟云学术

Influence of Substrate-Target Distance on Structural and Optical Properties of Ga and (Al + Ga)-doped ZnO Thin Films Deposited by Radio Frequency Sputtering

Published:2019-04-25 Issue:14 Volume:52 Page:2227-2238
ISSN:0003-2719
Container-title:Analytical Letters
language:en
Short-container-title:Analytical Letters

Author:

Toma M.¹,Marconi D.²,Pop Mariana³,Lung C.¹,Pop A.¹

Affiliation:

1. Physics Faculty, Babes-Bolyai University, Cluj-Napoca, Romania;

2. Department of Molecular and Biomolecular Physics, National Institute for Research and Development of Isotopic and Molecular Technologies, Cluj-Napoca, Romania;

3. Faculty of Material Engineering and Environement, Technical University of Cluj, Cluj-Napoca, Romania

Publisher

Informa UK Limited

Subject

Electrochemistry,Biochemistry (medical),Clinical Biochemistry,Spectroscopy,Biochemistry,Analytical Chemistry

Link

https://www.tandfonline.com/doi/pdf/10.1080/00032719.2019.1606819

Reference40 articles.

1. The structural and electrical properties of Ga-doped ZnO and Ga, B-codoped ZnO thin films: The effects of additional boron impurity

2. Synthesis and characterization of spray pyrolysis Zinc Oxide microrods

3. New challenges on gallium-doped zinc oxide films prepared by r.f. magnetron sputtering

4. Al-doped zinc oxide films deposited by simultaneous rf and dc excitation of a magnetron plasma: Relationships between plasma parameters and structural and electrical film properties

5. Crystal, optical, and electrical characteristics of transparent conducting gallium-doped zinc oxide films deposited on flexible polyethylene naphthalate substrates using radio frequency magnetron sputtering

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