On the optimization of the PIXE technique for thickness uniformity control of ultra-thin chromium layers deposited onto large surface quartz substrate-Reference-Cited by-同舟云学术

On the optimization of the PIXE technique for thickness uniformity control of ultra-thin chromium layers deposited onto large surface quartz substrate

Published:2006-08 Issue:1-2 Volume:249 Page:447-450
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Zahraman K.,Nsouli B.,Roumié M.,Thomas J.P.,Danel S.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference8 articles.

1. Critical behavior of the electrical resistance of very thin Cr films

2. On the phosphorus characterization in thin SiO2 (P,B) CVD layer deposited onto a silicon substrate by PIXE

3. Low energy PIXE: advantages, drawbacks, and applications

4. Application of low energy charged particle beams for chlorine analysis in silicon samples

5. Optimisation of peak-to-background ratios in proton-induced X-ray analysis of material deposited on thin and thick backings

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1. PIXE detection limit for aluminium thin film deposited on Si-based matrix;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-09

2. Investigation of thickness uniformity of thin metal films by using α-particle energy loss method and successive scanning measurements;Journal of Instrumentation;2017-03-06

3. Optical study of wedge-shaped films Part II Experiments;Journal of Optical Technology;2016-07-01

4. Experimental cross sections for L-shell x-ray production and ionization by protons;Atomic Data and Nuclear Data Tables;2014-05

5. On the Characterization of Ultra Thin Al Films Deposited onto SiC Substrate Using PIXE Technique;Advanced Materials Research;2011-08