Proton beam fabrication of nickel stamps for nanoimprint lithography

Author:

Ansari K.,Shao P.G.,van Kan J.A.,Bettiol A.A.,Watt F.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference17 articles.

1. Imprint of sub‐25 nm vias and trenches in polymers

2. Recent progress in nanoimprint technology and its applications

3. International technology roadmap for semiconductors, http://public.itrs.net. (2003) edition

4. Special Report Technol. Rev. 106 (2003) 36

5. M.T. Li, PhD Thesis Princeton University, Princeton, 2003

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1. Usage of Additive for the Improvement of the Filling Effect during Filling the Grating Structure of the Nanoimprint Stamp;ACTA PHOTONICA SINICA;2018

2. Quadrupole lens alignment with improved STIM and secondary electron imaging for Proton Beam Writing;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2017-08

3. An Effective Route for the Room Temperature Formation of Pd Coatings on Multiwalled Carbon Nanotubes in Aqueous Solutions;Bulletin of the Korean Chemical Society;2016-09-22

4. Room temperature preparation of Pt-decorated MWCNTs by using proton beam irradiation;Journal of the Korean Physical Society;2016-09

5. Micro-patterns fabrication using focused proton beam lithography;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2016-03

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