New method of Plasma doping with in-situ Helium pre-amorphization-Reference-Cited by-同舟云学术

New method of Plasma doping with in-situ Helium pre-amorphization

Published:2005-08 Issue:1-2 Volume:237 Page:41-45
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Sasaki Y.,Jin C.G.,Okashita K.,Tamura H.,Ito H.,Mizuno B.,Sauddin H.,Higaki R.,Satoh T.,Majima K.,Fukagawa Y.,Takagi K.,Aiba I.,Ohmi S.,Tsutsui K.,Iwai H.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference12 articles.

1. Shallow source/drain extensions for pMOSFETs with high activation and low process damage fabricated by plasma doping

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