The stability of SiO2 films prepared using a magnetron sputter type negative ion source (MSNIS)
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference12 articles.
1. Reflectance, transmittance, and loss spectra of multilayer Si/SiO_2 thin film mirrors and antireflection coatings for 15 μm
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Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Adhesion of SiO2 thin films to plasma-treated SUS304 stainless steel substrates;The Journal of Adhesion;2016-01-19
2. Aging effect of optical properties on SiO2films grown on Si substrates by ion beam sputtering;6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies;2012-10-16
3. Characteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS);Applied Surface Science;2005-12
4. Characteristics of Cu films prepared using a magnetron sputter type negative ion source (MSNIS);Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2005-04
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