Growth of Hydrogenated Nano-crystalline Silicon (nc-Si:H) Films by Plasma Enhanced Chemical Vapor Deposition (PE-CVD)-Reference-Cited by-同舟云学术

Growth of Hydrogenated Nano-crystalline Silicon (nc-Si:H) Films by Plasma Enhanced Chemical Vapor Deposition (PE-CVD)

Published:2017-03 Issue: Volume:110 Page:45-52
ISSN:1876-6102
Container-title:Energy Procedia
language:en
Short-container-title:Energy Procedia

Author:

Jadhavar Ashok,Pawbake Amit,Waykar Ravindra,Jadkar Vijaya,Kulkarni Rupali,Bhorde Ajinkya,Rondiya Sachin,Funde Adinath,Patil Dinkar,Date Abhijit,Pathan Habib,Jadkar Sandesh

Publisher

Elsevier BV

Reference27 articles.

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