Formation of palladium and titanium silicides by rapid thermal annealing
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference14 articles.
1. Formation kinetics and structure of Pd2Si films on Si
2. A study of Pd2Si films on silicon using Auger electron spectroscopy
3. Growth kinetics of Pd2Si from evaporated and sputter-deposited films
4. Growth kinetics and diffusion mechanism inPd2Si
5. Proc. Symp. on thin films interfaces and interactions;Cheung,1983
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1. Preparation of TiSi2 via flash lamp processing of TiN/Ti/Si heterostructures;Inorganic Materials;2009-06-28
2. Conventional furnace and rapid thermal annealing of cobalt films on Si(111);Thin Solid Films;1992-09
3. Palladium and platinum;Coordination Chemistry Reviews;1990-05
4. Palladium and Silicon;Pd Palladium;1989
5. Rapid isothermal processing;Journal of Applied Physics;1988-04-15
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