Transfer learning approach to analyzing the work function fluctuation of gate-all-around silicon nanofin field-effect transistors

Author:

Akbar Chandni,Li YimingORCID,Sung Wen-Li

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,General Computer Science,Control and Systems Engineering

Reference32 articles.

1. 5nm-gate nanowire FinFET;Yang,2004

2. Performance and design considerations for gate-all-around stacked-nanowires FETs;Mertens,2017

3. Large-scale “atomistic” approach to discrete-dopant-induced characteristic fluctuations in silicon nanowire transistors;Li;Physica Status Solidi (a),2008

4. Process variation effect, metal-gate work-function fluctuation and random dopant fluctuation of 10-nm gate-all-around silicon nanowire MOSFET devices;Li,2015

5. Finfet versus gate-all-around nanowire FET: performance scaling and variability;Nagy;IEEE J Electron Dev Soc,2018

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