Plasma dynamics as a key to successful upscaling of pulsed plasma processes
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference21 articles.
1. Preparation of TiB2 and TiBxNy coatings by PACVD
2. Investigation of PA-CVD of TiN: Relations between process parameters, spectroscopic measurements and layer properties
3. Wear-resistant PACVD coatings of the system Ti–B–N
4. Titanium nitride deposited by plasma-assisted chemical vapour deposition
5. Flow visualization studies for optimization of the growth of TiN by PACVD
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1. Pulsed-DC Discharge for Plasma CVD of Carbon Thin Films;IEEE Transactions on Plasma Science;2019-01
2. Asymmetric Bipolar Plasma Power Supply to Increase the Secondary Electrons Emission in Capacitive Coupling Plasmas;IEEE Transactions on Plasma Science;2018-08
3. Preparation of hydrogenated amorphous carbon films using a microsecond-pulsed DC capacitive-coupled plasma chemical vapor deposition system operated at high frequency up to 400 kHz;Japanese Journal of Applied Physics;2018-05-23
4. Novel high-frequency energy-efficient pulsed-dc generator for capacitively coupled plasma discharge;Review of Scientific Instruments;2018-03
5. Influence of Time Domain Parameters on Unipolar Pulse Plasma System Transition State;Materials and Manufacturing Processes;2009-10-19
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