NIR laser diode and FTIR based process control for industrial CVD reactors-Reference-Cited by-同舟云学术

NIR laser diode and FTIR based process control for industrial CVD reactors

Published:2001-07 Issue: Volume:142-144 Page:328-332
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hopfe V.,Sheel D.W.,Graehlert W.,Throl O.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference8 articles.

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3. Sanders H.E., Chemical vapor deposition, M.D. Allendorf, and C. Bernard (Eds.), Proceedings of the 14th International Conference and EUROCVD-11, Paris 5-9 September 1997, pp. 81–88.

4. In-situ FTIR emission spectroscopy in a technological environment: chemical vapour infiltration (CVI) of SiC composites

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