Calibration of reactive process gases for the characterization of semiconductor processes by FTIR-Reference-Cited by-同舟云学术

Calibration of reactive process gases for the characterization of semiconductor processes by FTIR

Published:2005-06 Issue: Volume:744-747 Page:247-253
ISSN:0022-2860
Container-title:Journal of Molecular Structure
language:en
Short-container-title:Journal of Molecular Structure

Author:

Mohn J.,Beck U.,Zeyer K.,Emmenegger L.

Publisher

Elsevier BV

Subject

Inorganic Chemistry,Organic Chemistry,Spectroscopy,Analytical Chemistry

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