Generation of triggerless silicon shunting plasma and ion extraction-Reference-Cited by-同舟云学术

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Generation of triggerless silicon shunting plasma and ion extraction

Published:2001-07 Issue: Volume:142-144 Page:388-391
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Yukimura Ken,Tani Yuji

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference3 articles.

1. K. Yukimura, S. Masamune, R. Isono, T. Monguchi, K. Yoshioka, Proceedings of the 1998 International Conference on Ion Implantation Technology, pp. 381–384.

2. Pulsed metal ion source by triggerless shunting arc discharge

3. K. Yukimura, K. Yoshioka, Y. Tani, Carbon shunting arc and its induced plasma, Proceedings of the 14th International Symposium on Plasma Chemistry, 1999, pp. 507–512.

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1. Special Arc Modes with Reduced Macroparticle Emission;Tetrahedrally Bonded Amorphous Carbon Films I;2018

2. A New Approach to High-Power Pulsed Glow Plasma Generation: Shunting Glow Plasma;IEEE Transactions on Plasma Science;2012-07

3. Shunting arc generation by parallel rod configuration;Plasma Sources Science and Technology;2011-01-07

4. Production of Titanium-Containing Carbon Plasma Using Shunting Arc Discharge for Hybrid Film Deposition;Japanese Journal of Applied Physics;2010-04-20

5. Industrial Applications of Pulsed Power Technology;IEEE Transactions on Dielectrics and Electrical Insulation;2007-10

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