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RF ion source for low energy ion implantation — beam profile control of a large-area ion source using 500-MHz discharge

  • Published:2001-02 Issue:1-3 Volume:136 Page:281-284
  • ISSN:0257-8972
  • Container-title:Surface and Coatings Technology
  • language:en
  • Short-container-title:Surface and Coatings Technology

Author:

Tanjyo Masayasu,Sakai Shigeki,Takahashi Masato

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference7 articles.

1. The International Technology Roadmap for Semiconductors 1999,1999

2. Advanced applications of ion implantation for electronic materials;Current,1996

3. Serial Ion Implantation Technology for Deep Sub-micron Devices;Tanjyo,1998

4. Development of an ion source for the low energy ion implantation

5. Proceedings of the Seventh Workshop on Beam Engineering Advanced Material Syntheses, BEAMS 1998, Ionics, Tokyo;Sakai,1998

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