A pulsed inductively coupled plasma source for plasma-based ion implantation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference12 articles.
1. Repetitively pulsed metal ion beams for ion implantation
2. Plasma source ion‐implantation technique for surface modification of materials
3. Cost estimates for commercial plasma source ion implantation
4. Plasma ion implantation technology at Hughes Research Laboratories
5. Initial operation of a large-scale plasma source ion implantation experiment
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