Asymmetric bipolar pulsed power: a new power technology-Reference-Cited by-同舟云学术

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Asymmetric bipolar pulsed power: a new power technology

Published:1998-01 Issue:1-3 Volume:98 Page:823-827
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Scholl Richard A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference13 articles.

1. A quasi-direct current sputtering technique for deposition of dielectrics at enhanced rates;Este;J. Vac. Sci. Technol. A,1988

2. R.L. Cormia et al., Method for coating a substrate, US Patent 4 046 659, issued Sept. 6, 1977 and assigned to Airco Corp., Berkeley, CA, USA.

3. F. Milde;Shiller;Surf. Coat. Technol.,1993

4. H. Walde;Frach;Surf. Coat. Technol.,1993

5. 37th Annu. Technical Conf. Proc.;Graham,1994

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4. Pulsed-DC Discharge for Plasma CVD of Carbon Thin Films;IEEE Transactions on Plasma Science;2019-01

5. Pulsed DC plasma CVD system for the deposition of DLC films;Materials Today Communications;2018-03

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