Characteristics in reactive arc evaporation
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference5 articles.
1. Predicting thin‐film stoichiometry in reactive sputtering
2. Modelization of reaction kinetics of nitrogen and titanium during TiN arc deposition
3. Complex characterisation of vacuum arc-deposited chromium nitride thin films
4. Hysteresis effect in reactive sputtering: a problem of system stability
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1. Influence of Acetylene on Ti Target Poisoning During Pulse-Enhanced Vacuum Arc Evaporation;IEEE Transactions on Plasma Science;2020-08
2. Effect of Ti-Al cathode grain size on plasma generation and thin film synthesis from a direct current vacuum arc plasma source;AIP Advances;2019-04
3. Effect of Si on DC arc plasma generation from Al-Cr and Al-Cr-Si cathodes used in oxygen;Journal of Applied Physics;2017-02-28
4. Ti0·33Al0.67 cathode surface modifications and the effect on the mechanical and electrochemical properties of AlTiN coating;Vacuum;2016-09
5. Erosion behavior of composite Al-Cr cathodes in cathodic arc plasmas in inert and reactive atmospheres;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2016-03
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