Investigation of TiN deposition in different sized PACVD reactors by means of optical emission spectroscopy
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference7 articles.
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2. How TiN coatings improve the performance of high speed tools;Hedenqvist;Surf. Coat. Technol.,1990
3. Structure and properties of TiN coatings;Sundgren;Thin Solid Films,1985
4. Investigation of PA-CVD of TiN: relations between process parameters spectroscopic measurements and layer properties;Rie;Surf. Coat. Technol.,1993
5. TiN film formation by plasma chemical vapour deposition and its plasma diagnostics;Ishii;Surf. Coat. Technol.,1991
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