Amorphisation and related structural effects in thin films prepared by ion beam assisted methods-Reference-Cited by-同舟云学术

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Amorphisation and related structural effects in thin films prepared by ion beam assisted methods

Published:2000-03 Issue:1-3 Volume:125 Page:116-123
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

González-Elipe A.R.,Yubero F.,Espinós J.P.,Caballero A.,Ocaña M.,Holgado J.P.,Morales J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference27 articles.

1. Handbook of Ion Beam Processing Technology;Kay,1989

2. Effects of ion-beam-assisted deposition on the growth of zirconia films

3. Handbook of Ion Beam Processing Technology;Baglin,1989

4. Correlation between the stress and microstructure in bias-sputtered ZrO2-Y2O3 films

5. On silicon amorphization during different mass ion implantation

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1. Effect of Irradiation-Induced Interfaces on Thin Film Stability;Science and Technology of Interfaces;2013-10-18

2. Electrical characteristics of mixed Zr–Si oxide thin films prepared by ion beam induced chemical vapor deposition at room temperature;Thin Solid Films;2009-07

3. Modelling irradiation induced metastability in ceramic thin films;physica status solidi (c);2007-03

4. Plasma and ion sources in large area coating: A review;Surface and Coatings Technology;2005-11

5. Structural, Optical, and Photoelectrochemical Properties of Mn+−TiO2 Model Thin Film Photocatalysts;The Journal of Physical Chemistry B;2004-10-14

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