Correlation between the stress and microstructure in bias-sputtered ZrO2-Y2O3 films
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials
Reference21 articles.
1. Thin Films Deposited by Bias Sputtering
2. Bias sputtering: its techniques and applications
3. Control of Film Properties by rf-Sputtering Techniques
4. The Influence of Ion Bombardment on the Microstructure of Thick Deposits Produced by High Rate Physical Vapor Deposition Processes
5. Structure Modification by Ion Bombardment during Deposition
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4. Factors Influencing Adhesion of Submicrometer Thin Metal Films;Progress in Adhesion and Adhesives;2017-06-30
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