UV laser photochemistry and diborane at 193 nm: Quantum yield for BH3 production
Author:
Publisher
Elsevier BV
Subject
General Physics and Astronomy,General Chemical Engineering,General Chemistry
Reference15 articles.
1. UV‐laser photochemistry of diborane at 193.3 nm: The exchange reaction with deuterium
2. Photolysis of Diborane at 1849 Å
3. Formation of hydrogen in the photolysis of diborane at 1849 A
4. Silane purification via laser‐induced chemistry
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1. The Photochemistry of Boron Compounds;Tetrahedron;2000-09
2. Oxidation of B, BH, BH2, and BmHn Species: Thermochemistry and Kinetics;Chemical Reviews;1996-01-01
3. Effects of plasma and/or 193 nm excimer‐laser irradiation in chemical‐vapor deposition of boron films from B2H6+He;Journal of Applied Physics;1992-06
4. Effects of plasma and/or 193 nm excimer laser irradiation on the surface in chemical vapor deposition of boron films from B2H6+He;Applied Physics Letters;1991-07-29
5. O(3P) attack on boranes. II. B5H9;The Journal of Chemical Physics;1991-06
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