Interface Charge Density Measurement for Ultra Thin ZrO2 Material Based MOS Devices Using Conductance Method
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference8 articles.
1. Engel-Herbert R, Hwang Y, Stemmer S. Comparison of methods to quantify interface trap densities at dielectric/III-V semiconductor interfaces. Journal of Applied Physics 2010; 108: Article ID 124101.
2. Analysis of abnormal upturns in capacitance voltage characteristics for MOS devices with High-k dielectrics;Sohn;IEEE Electron Device Letters,2011
3. CrystallineZrTiO4- gated Ge metal-oxide-semiconductor devices with amorphous Yb2O3 as a passivation layer;Wu;IEEE Transactions on Nanotechnology,2013
4. Dual-metal gate CMOS technology with ultrathin silicon nitride gate dielectric;Yeo;IEEE Electron Device Letters,2011
5. Analysis of Flatband Voltage for MOS Devices Using High-k Dielectric Materials;Maity;Procedia Material Science,2014
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