Predictive estimation of vacuum ultraviolet emission intensity in a low-pressure inductively coupled hydrogen plasma based on the branching ratio technique

Author:

Han Jonggu,Park Woojin,Kim Jongsik,Han DuksunORCID,Han Kyunghun,Kang Chansoo,Moon Se YounORCID

Publisher

Elsevier BV

Subject

General Physics and Astronomy,General Materials Science

Reference22 articles.

1. The grand challenges of plasma etching: a manufacturing perspective;Lee;J. Phys. D Appl. Phys.,2014

2. Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance;Marsik;Thin Solid Films,2011

3. Impact of VUV photons on SiO2 and organosilicate low-k dielectrics: general behavior, practical applications, and atomic models;Baklanov;Appl. Phys. Rev.,2019

4. Damage to low-k porous organosilicate glass from vacuum-ultraviolet irradiation, Damage to VUV;Shohet;EUV, X-Ray Opt. III.,2011

5. Photoabsorption and damage of OSG low-k films by VUV emission at 140-160 nm, Plasma Process;Lopaev;Polym,2018

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