Author:
Fournier J.,DeSisto W.,Brusasco R.,Sosnowski M.,Kershaw R.,Baglio J.,Dwight K.,Wold A.
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Reference16 articles.
1. Thin films of metal oxides on silicon by chemical vapor deposition with organometallic compounds. I
2. Surface Protection and Selective Masking during Diffusion in Silicon
3. B. E. Deal and J. D. Plummer, in “Integrated Circuits Process Models,” J. D. Meindl and K. C. Saraswat, Eds. Prentice Hall, Englewood Cliffs, NJ, In press.
4. Applied Solid State Science, Supplement 2, Silicon Integrated Circuits, Part B;Fair,1981
5. Materials, Properties and Preparation;Pliskin,1981
Cited by
34 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献