Room temperature dry processing of patterned CVD graphene devices-Reference-Cited by-同舟云学术

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Room temperature dry processing of patterned CVD graphene devices

Published:2015-05 Issue: Volume:86 Page:256-263
ISSN:0008-6223
Container-title:Carbon
language:en
Short-container-title:Carbon

Author:

Mahmood Ather,Yang Cheol-Soo,Dayen Jean-François,Park Serin,Kamalakar M. Venkata,Metten Dominik,Berciaud Stéphane,Lee Jeong-O.,Doudin Bernard

Funder

Agence Nationale de la Recherche

National Research foundation of Korea

Publisher

Elsevier BV

Subject

General Chemistry,General Materials Science

Reference53 articles.

1. Electric field effect in atomically thin carbon films;Novoselov;Science,2004

2. Experimental observation of the Quantum Hall effect and Berry’s phase in graphene;Zhang;Nature,2005

3. 100-GHz transistors from wafer-scale epitaxial graphene;Lin;Science,2010

4. Progress, challenges, and opportunities in two-dimensional materials beyond graphene;Butler;ACS Nano,2013

5. Evolution of graphene growth on Ni and Cu by carbon isotope labeling;Li;Nano Lett,2009

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