Determination of the stress level in growing NiO films by X-ray diffraction
Author:
Publisher
Elsevier BV
Subject
General Engineering
Reference9 articles.
1. Proceedings of the Conference “Stress Effects and the Oxidation of Metals”;Rhines,1979
2. Electrical Properties of NiO
3. Caractérisation mécanique des surfaces par diffraction X
4. A diffraction measurement of the structure of Cu2O films grown on copper
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1. The Stress State in Thermally Grown NiO Scales;Materials Science Forum;1997-10
2. Evaluation of stresses in NiNiO and CrCr2O3 during high temperature oxidation by in situ X-ray diffraction;Materials Science and Engineering: A;1994-04
3. The Effective Thermal Expansion of Nickel and Nickel Oxide During High-Temperature Oxidation;Advances in X-Ray Analysis;1994
4. The mechanical failure of oxide scales under tensile or compressive load;Journal of Materials Science;1993-12
5. The growth of oxide platelets on nickel in pure oxygen. II. Surface analyses and growth mechanism;Oxidation of Metals;1993-02
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