Synthesis and characterization of norbornene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists-Reference-Cited by-同舟云学术

Synthesis and characterization of norbornene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists

Published:2002-03 Issue:6 Volume:43 Page:1963-1967
ISSN:0032-3861
Container-title:Polymer
language:en
Short-container-title:Polymer

Author:

Kim Jin-Baek,Lee Jae-Jun

Publisher

Elsevier BV

Subject

Polymers and Plastics,Materials Chemistry,Organic Chemistry

Reference17 articles.

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5. Evaluation of cycloolefin-maleic anhydride alternating copolymers as single-layer photoresists for 193-nm photolithography

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