Adhesion-promoted copolymers based on norbornene derivatives and maleic anhydride for 193-nm photoresists
Author:
Publisher
Elsevier BV
Subject
Polymers and Plastics,Materials Chemistry,Organic Chemistry
Reference17 articles.
1. Chemically amplified resists based on the norbornene copolymers with steroid derivatives
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3. Asymmetric Induction in a 1,4-Cycloaddition Reaction. Influence of Variation of Configuration of the Asymmetric Center
4. Stereochemistry of the Diels-Alder Reaction.
5. Asymmetrische induktion bei diels-alder-reaktionen
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1. Design, synthesis, and photosensitive performance of polymethacrylate-positive photoresist-bearingo-nitrobenzyl group;Journal of Applied Polymer Science;2014-12-04
2. Synthesis of Copolymers Containing Vinylbenzyl Abietate and Their Application as Photocrosslinkable Binder Polymer;Molecular Crystals and Liquid Crystals;2005-12
3. Adhesion Enhancement of Norbornene Polymers with Lithocholate Substituents for 193-nm Resists;Polymer Journal;2004-01
4. Copolymers from tert-butyl methacrylate and itaconic anhydride––reactivity ratios and polymer analogous reactions;European Polymer Journal;2003-03
5. Investigations of the Adhesion of Maleic Anhydride/Cyclic Olefin Alternating Copolymers to Silicon Substrates: Improved Materials for 193 nm Lithography;The Journal of Adhesion;2002-01
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