Defects in ion-implanted hcp-titanium: A first-principles study of electronic structures-Reference-Cited by-同舟云学术

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Defects in ion-implanted hcp-titanium: A first-principles study of electronic structures

Published:2011-12 Issue:24 Volume:151 Page:1889-1893
ISSN:0038-1098
Container-title:Solid State Communications
language:en
Short-container-title:Solid State Communications

Author:

Raji Abdulrafiu T.,Mazzarello Riccardo,Scandolo Sandro,Nsengiyumva Schadrack,Härting Margit,Britton David T.

Publisher

Elsevier BV

Subject

Materials Chemistry,Condensed Matter Physics,General Chemistry

Reference43 articles.

1. Point defect diffusion in α-Zr

2. One-Dimensional Fast Migration of Vacancy Clusters in Metals

3. Vacancies in solids and the stability of surface morphology

4. Ab initio characterization of arsenic vacancy diffusion pathways in GaAs with SIEST-A-RT

5. C. Fundamental Aspects of Inert Gases in Solids,1991

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1. Catalytic Descriptors for the Design of Ziegler–Natta Catalysts Revealed by the Investigation of the Cl–Ti(0001) Interaction by Density of States Calculations;The Journal of Physical Chemistry C;2017-09-20

2. Stress enhanced diffusion of krypton ions in polycrystalline titanium;Journal of Applied Physics;2014-07-14

3. DFT Simulations of Titanium Oxide Films on Titanium Metal;The Journal of Physical Chemistry C;2012-12-24

4. A complete and self-consistent evaluation of XPS spectra of TiN;Journal of Electron Spectroscopy and Related Phenomena;2012-11

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