Virtual metrology of semiconductor PVD process based on combination of tree-based ensemble model-Reference-Cited by-同舟云学术

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Virtual metrology of semiconductor PVD process based on combination of tree-based ensemble model

Published:2020-08 Issue: Volume:103 Page:192-202
ISSN:0019-0578
Container-title:ISA Transactions
language:en
Short-container-title:ISA Transactions

Author:

Chen Ching-Hsien,Zhao Wei-Dong,Pang Timothy,Lin Yi-Zheng

Publisher

Elsevier BV

Subject

Applied Mathematics,Control and Systems Engineering,Electrical and Electronic Engineering,Computer Science Applications,Instrumentation

Reference27 articles.

1. Semi-supervised support vector regression based on self-training with label uncertainty: An application to virtual metrology in semiconductor manufacturing;Kang;Expert Syst Appl,2016

2. In-situ particle monitor using virtual metrology system for measuring particle contamination during plasma etching process;Abdullah,2016

3. Adaptive virtual metrology design for semiconductor dry etching process through locally weighted partial least squares;Hirai;IEEE Trans Semicond Manuf,2015

4. Darwin T, Garnett R, Djurdjanovic D. Gaussian process regression for virtual metrology of microchip quality and the resulting selective sampling scheme. In: Proc. international conference on the industry 4.0 model for advanced manufacturing. 2018. p. 250–64.

5. Virtual metrology modeling of time-dependent spectroscopic signals by a fused lasso algorithm;Park;J Process Control,2016

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