The long-range ordering, electron spectrum, and properties of amorphous silicon films – II. Defect states and optical parameters
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference43 articles.
1. Small-Angle-Scattering Evidence of Voids in Hydrogenated Amorphous Silicon
2. Positron‐lifetime studies of hydrogenated amorphous silicon
3. Characterization of microvoids in device-quality hydrogenated amorphous silicon by small-angle x-ray scattering and infrared measurements
4. The effects of hydrogen partial pressure on reactively sputtered amorphous silicon
5. Deuteron and proton magnetic resonance in amorphous silicon
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. The “Generalized Skettrup Model” and Lattice Thermal Capacity of Graphene, h-BN, MoS2, and WS2 Flakes;ECS Journal of Solid State Science and Technology;2020-10-01
2. Correlations among hydrogen bonding configuration, structural order and optical coefficients in hydrogenated amorphous germanium obtained by x-ray-activated chemical vapour deposition;Journal of Physics D: Applied Physics;2009-04-27
3. Visible photoluminescence from plasma-synthesized SiO2-buffered SiNx films: Effect of film thickness and annealing temperature;Journal of Applied Physics;2008-03
4. Time dependence and excitation spectra of the photoluminescence emission at 1.54μm in Si-nanocluster and Er co-doped silica;Optical Materials;2005-02
5. The long-range ordering, electron spectrum, and properties of amorphous silicon films—III: Roles of multi-phonon and diabatic effects at carrier excitations;Physica B: Condensed Matter;2004-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3