Glancing-angle X-ray diffraction and X-ray photoelectron spectroscopy studies of nitrogen-implanted tantalum-Reference-Cited by-同舟云学术

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Glancing-angle X-ray diffraction and X-ray photoelectron spectroscopy studies of nitrogen-implanted tantalum

Published:1989-08 Issue: Volume:115 Page:73-77
ISSN:0921-5093
Container-title:Materials Science and Engineering: A
language:en
Short-container-title:Materials Science and Engineering: A

Author:

Raole P.M,Narsale A.M,Kothari D.C,Pawar P.S,Gogawale S.V,Guzman L,Dapor M

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference15 articles.

1. Properties of direct current magnetron reactively sputtered TaN

2. Manufacture and properties of ceramic cutting tools: a review

3. Structure of Tantalum Nitrides

4. Effect of nitrogen on the electrical and structural properties of triode‐sputtered tantalum films

5. Changes in the phase structure and formation of chemical compounds by ion implantation of tantalum thin films

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Structural and mechanical properties of tantalum thin films ected by nitrogen ion implantation;Modern Physics Letters B;2020-03-09

2. Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering;ACTA METALL SIN;2019

3. Ru-induced microstructural change in ion-plated TiN coating and its tribological properties;Surface and Coatings Technology;2018-11

4. Stoichiometry and tribological behavior of thick Ta(N) coatings produced by direct current magnetron sputtering (DCMS);Applied Surface Science;2018-01

5. Nanosecond long excited state lifetimes observed in hafnium nitride;Solar Energy Materials and Solar Cells;2017-09

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