Author:
Brożek Tomasz,Huber John,Walls James
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Safety, Risk, Reliability and Quality,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference11 articles.
1. Plasma‐charging damage: A physical model
2. Brożek T, Dao T. Third Int Symp PPID, 1998. p. 46
3. Alavi M, Jacobs S, Ahmed S, Chern C-H, McGregor P. Second Int Symp PPID, 1997. p. 7
4. Li X, Brozek T, Chan YD, Preuninger F, Viswanathan CR. J Vac Sci Technol B 1996;14:571
5. Using SEMATECH Electrical Test Structures in Assessing Plasma Induced Damage in Poly Etching
Cited by
3 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. The role of plasma analytics in leading-edge semiconductor technologies;Contributions to Plasma Physics;2018-02-14
2. Plasma Etch;Handbook of Semiconductor Manufacturing Technology, Second Edition;2007-07-09
3. Improvement of poly-silicon hole induced gate oxide failure by silicon rich oxidation;Microelectronics Reliability;2003-05