Heats of formation of GeH4, GeF4 and Ge(CH3)4
Author:
Publisher
Elsevier BV
Subject
Physical and Theoretical Chemistry,General Physics and Astronomy
Reference59 articles.
1. Low temperature poly-SixGe1−x deposited by reactive thermal CVD for thin film transistor application
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4. Theoretical study of GeHn, AsHn, and SeHn: Bond dissociation energies
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