Computational Thermochemistry of Mono- and Dinuclear Tin Alkyls Used in Vapor Deposition Processes-Reference-Cited by-同舟云学术

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Computational Thermochemistry of Mono- and Dinuclear Tin Alkyls Used in Vapor Deposition Processes

Published:2019-02-12 Issue:7 Volume:123 Page:1451-1460
ISSN:1089-5639
Container-title:The Journal of Physical Chemistry A
language:en
Short-container-title:J. Phys. Chem. A

Author:

Harkins Robin P.¹,Cramer Christopher J.¹^ORCID,Gladfelter Wayne L.¹^ORCID

Affiliation:

1. Department of Chemistry, University of Minnesota—Twin Cities, Minneapolis, Minnesota 55455, United States

Funder

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/acs.jpca.8b12072

Reference85 articles.

1. In situ monitoring of optical coatings on architectural glass and comparison of the accuracy of the layer thickness attainable with ellipsometry and photometry

2. Development of lightweight returnable bottles

3. Tin oxide transparent thin-film transistors

4. Aligned Epitaxial SnO2 Nanowires on Sapphire: Growth and Device Applications

5. Gas sensing properties in epitaxial SnO2 films grown on TiO2 single crystals with various orientations

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Precursor selection in hybrid molecular beam epitaxy of alkaline-earth stannates;Journal of Vacuum Science & Technology A;2020-12

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