Research on improving the transverse resolution of binary optical element by digital-division-mask technique-Reference-Cited by-同舟云学术

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Research on improving the transverse resolution of binary optical element by digital-division-mask technique

Published:2010-07 Issue:13 Volume:121 Page:1164-1169
ISSN:0030-4026
Container-title:Optik
language:en
Short-container-title:Optik

Author:

Gao Yiqing,Wei Lanlan,Luo Ningning,Chen Tingzheng,Sun Chunhua,Chen Min

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference18 articles.

1. Binary phase only filters for rotation and scale invariant pattern recognition with the joint transform correlater;Butter;Opt. Commun.,2006

2. Precision measurement with visual feedback using binary phase diffractive optical elements;Buckley;Opt. Lett.,2006

3. Binary optical true-time delay based on the white cell: design and demonstration;Anderson;J. Lightwave Technol.,2006

4. Integrated waveguide microoptic elements for 3D routing in board-level optical interconnects;Alexei;Proc. SPIE,2006

5. Low polarization dependent diffractive grating for wavelength demultimlexing;Popov;Opt. Exp.,2004

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1. Experimental Study of Numerical Optimization for 3-D Microstructuring Using DMD-Based Grayscale Lithography;Journal of Microelectromechanical Systems;2015-12

2. Maskless Lithography Based on DMD;Key Engineering Materials;2013-05

3. Adjustment of image decomposition mode and reflection criterion focusing on critical dimension uniformity and exposure dose effectiveness under diffraction effects in optical microlithography using a digital micromirror device;SPIE Proceedings;2013-04-12

4. Parameters affecting pattern fidelity and line edge roughness under diffraction effects in optical maskless lithography using a digital micromirror device;SPIE Proceedings;2012-11-26

5. Influence of dynamic sub-pixelation on exposure intensity distribution under diffraction effects in spatial light modulation based lithography;Microelectronic Engineering;2012-10

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