Maskless Lithography Based on DMD

Author:

Zhong Ke Jun1,Gao Yi Qing1,Li Feng1

Affiliation:

1. Nanchang Hangkong University

Abstract

Largely owing to the high cost of masks for lithography, recently there is a strong interest in maskless lithography. Maskless lithography is a potential program to overcome the high cost caused by rising price of the masks. Because of the advantages of low cost, high flexibility and short production cycle, digital mirror device (DMD)-based maskless lithography has been brought storm attention by people. Both the theory and experiment of DMD-based maskless lithography achieved good results. Maskless lithography systems based on DMD are analyzed in this review. Principles of construction, examples of implication, as well as future development direction are discussed.

Publisher

Trans Tech Publications, Ltd.

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

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