Oxygen amount effect on optical properties of aluminium oxide nanostructured films prepared by reactive magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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3. Fabrication and characterization of MFISFET using Al2O3 insulating layer for non-volatile memory;Shin;Integr. Ferroelectr.,2001
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