Atomistic kinetic Monte Carlo simulations of polycrystalline copper electrodeposition-Reference-Cited by-同舟云学术

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Atomistic kinetic Monte Carlo simulations of polycrystalline copper electrodeposition

Published:2014-09 Issue: Volume:46 Page:140-143
ISSN:1388-2481
Container-title:Electrochemistry Communications
language:en
Short-container-title:Electrochemistry Communications

Author:

Treeratanaphitak Tanyakarn,Pritzker Mark D.,Abukhdeir Nasser Mohieddin^ORCID

Publisher

Elsevier BV

Subject

Electrochemistry

Reference30 articles.

1. Damascene copper electroplating for chip interconnections

2. Electrodeposition of ZnO nanowires with controlled dimensions for photovoltaic applications: Role of buffer layer

3. Nanoporous metals: fabrication strategies and advanced electrochemical applications in catalysis, sensing and energy systems

4. Kinetic Monte Carlo simulation of electrodeposition using the embedded-atom method

5. Comparative Monte Carlo Study of Monolayer Growth in a Heteroepitaxial System in the Presence of Surface Defects

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1. Research on Surface Morphology of Gold Micro Bumps Based on Monte Carlo Method;Micromachines;2023-06-30

2. Kinetic Monte Carlo simulation of polycrystalline silver metal electrodeposition: scaling of roughness and effects of deposition parameters;Physical Chemistry Chemical Physics;2023

3. Morphological Surface Study of Silver Electrodeposition by Kinetic Monte Carlo‐Embedded Atom Method;physica status solidi (b);2022-03-22

4. Electrodeposition of lithium metal on lithium anode surface, a simulation study by: Kinetic Monte Carlo-embedded atom method;Computational Materials Science;2021-05

5. Atomistic kinetic Monte Carlo—Embedded atom method simulation on growth and morphology of Cu–Zn–Sn precursor of Cu2ZnSnS4 solar cells;Journal of Materials Research;2020-01-17

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