Author:
Deng Hui,Hosoya Kenji,Imanishi Yusuke,Endo Katsuyoshi,Yamamura Kazuya
Reference17 articles.
1. Chemomechanical polishing of silicon carbide;Zhou;J. Electrochem. Soc.,1997
2. Atomic -scale flattening of SiC surfaces by electroless chemical etching in HF solution with Pt catalyst;Arima;Appl. Phys. Lett.,2007
3. Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface;Yamamura;Ann. ICRP,2011
4. Atomic-scale flattening mechanism of 4H-SiC (0001) in plasma assisted polishing;Deng;Ann. ICRP,2013
5. Mechanochemical polishing of silicon carbide crystal with chromium (III) oxide abrasive;Kikuchi;J. Am. Ceram. Soc.,1992
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