Platinum additive impacts on vapor-liquid-solid growth chemical interface for high-quality SiC single crystal films-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Platinum additive impacts on vapor-liquid-solid growth chemical interface for high-quality SiC single crystal films

Published:2020-06 Issue: Volume:16 Page:100266
ISSN:2468-5194
Container-title:Materials Today Chemistry
language:en
Short-container-title:Materials Today Chemistry

Author:

Osumi A.,Nakano K.,Sannodo N.,Maruyama S.,Matsumoto Y.,Mitani T.,Kato T.,Yonezawa Y.,Okumura H.

Funder

New Energy and Industrial Technology Development Organization

Japan Science and Technology Agency

Publisher

Elsevier BV

Subject

Materials Chemistry,Colloid and Surface Chemistry,Polymers and Plastics,Biomaterials,Electronic, Optical and Magnetic Materials,Catalysis

Reference28 articles.

1. Stable and high-speed SiC bulk growth without dendrites by the HTCVD method

2. Thermodynamic equilibrium limitations on the growth of SiC by halide chemical vapor deposition

3. Fast growth of n-type 4H-SiC bulk crystal by gas-source method

4. Crystallinity Evaluation of 4H-SiC Single Crystal Grown by Solution Growth Technique Using Si-Ti-C Solution

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Gas–Liquid Interface Route to Hybrid Copper Bromine Perovskite Single-Crystal Membrane with Dielectric Transitions and Ferromagnetic Exchanges;Inorganic Chemistry;2024-04-03

2. Recent Progress in Vacuum Engineering of Ionic Liquids;Molecules;2023-02-20

3. Direct visualization of high-temperature dissolution dynamics of α-Al2O3(0 0 0 1) with an oxide-based melt flux of Sn:BiOx;Chemical Physics Letters;2022-09

4. Direct visualization of kinetic reversibility of crystallization and dissolution behavior at solution growth interface of SiC in Si-Cr solvent;Surfaces and Interfaces;2022-02

5. Vapor–liquid–solid growth of 4H-SiC single crystal films with extremely low carrier densities in chemical vapor deposition with a Pt–Si alloy flux and X-ray topography analysis of their dislocation propagation behaviors;CrystEngComm;2021

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3