Mechanism of electron multiplication due to charging for a SiO2 sample with a buried microstructure in SEM: A simulation analysis-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Mechanism of electron multiplication due to charging for a SiO2 sample with a buried microstructure in SEM: A simulation analysis

Published:2016-11 Issue: Volume:90 Page:64-70
ISSN:0968-4328
Container-title:Micron
language:en
Short-container-title:Micron

Author:

Wang Fang,Feng Guobao,Zhang Xiusheng,Cao Meng

Funder

National Natural Science Foundation of China

Foundation of National Key Laboratory of Space Microwave Technology China

Publisher

Elsevier BV

Subject

Cell Biology,Structural Biology,General Physics and Astronomy,General Materials Science

Reference28 articles.

1. Contrast reversal effect in scanning electron microscopy due to charging;Abe;J. Vac. Sci. Technol. B,2009

2. Effects of fast secondary electrons to low-voltage electron beam lithography;Bolorizadeh;J. Micro Nanolithogr. MEMS MOEMS,2007

3. Some considerations on the secondary electron emission, δ, from e-irradiated insulators;Cazaux;J. Appl. Phys.,1999

4. Modeling secondary electron images for linewidth measurement by critical dimension scanning electron microscopy;Ciappa;Microelectron. Reliab.,2010

5. Monte Carlo modeling of surface excitation in reflection electron energy loss spectroscopy spectrum for rough surfaces;Da;J. Appl. Phys.,2012

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characteristics of secondary electron emission from few layer graphene on silicon (111) surface;Chinese Physics B;2022-09-01

2. Characteristics of surface discharging and gas desorption of PTFE due to electron beam irradiation;Physics of Plasmas;2021-05

3. Self‐consistent charging of PMMA thin film induced by a penetrating electron beam in electron microscopy;Journal of Microscopy;2021-01-04

4. Transient Characteristics of Charging Effects due to E-Beam Irradiation: A Method of SEY-Based Charging Balance Mode;IEEE Transactions on Plasma Science;2019-08

5. Dynamic characteristics of charging effects on the dielectric constant due to E-beam irradiation: a numerical simulation;Plasma Science and Technology;2018-01-25

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号京ICP备18003416号-3