Etching of UO2 in NF3 RF plasma glow discharge

Author:

Veilleux John M,El-Genk Mohamed S,Chamberlin E.P,Munson C,FitzPatrick J

Publisher

Elsevier BV

Subject

Nuclear Energy and Engineering,General Materials Science,Nuclear and High Energy Physics

Reference28 articles.

1. R.P. Allen, R.F. Hazelton, Conversion of Transuranic Waste to Low Level Waste by Decontamination – A Technical and Economic Evaluation, Battelle TR PNL-5315, December 1984

2. Demonstration of plutonium etching in a RF glow discharge

3. Comparison of the Etching and Plasma Characteristics of Discharges in  CF 4 and  NF 3

4. M.S. El-Genk, H. H. Saber, J. M. Veilleux, Analysis and modeling of decontamination experiments of depleted uranium oxide in RF plasma, in: Proceedings of the International Symposium on Heat and Mass Transfer Under Plasma Conditions, Antalya, Turkey, 19–23 April 1999

5. Radio frequency sputtering—the significance of power input

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