A study of charge trapping in the Al-Al2O3-Si, MIS system
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference8 articles.
1. Nonavalanche injection of hot carriers into SiO2
2. Non-avalanche electron injection in the Al2O3 system;Kolk,1978
3. Physical and Chemical Properties of Aluminum Oxide Film Deposited by AlCl3-CO2-H2System
4. Properties of Al2 O 3 Films Deposited from the AlCl3, CO 2, and H 2 System
5. Int. Conf.;Nigh,1969
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