Effects of proton implantation and hydrogen plasma passivation on electrical properties of InGaAlP and InGaP

Author:

Polyakov A.Y,Chelniy A.A,Govorkov A.V,Smirnov N.B,Milnes A.G,Pearton S.J,Wilson R.G,Balmashnov A.A,Aluev A.N,Markov A.V

Publisher

Elsevier BV

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Gallium Arsenide and Related Compounds 1989;Ishikawa,1989

2. Advanced III–V Compound Semiconductors Growth, Processing and Devices;Tanaka,1990

3. Growth of high-quality inGaAIP epilayers by MOCVD using methyl metalorganics and their application to visible semiconductors lasers

4. Npn and pnp GaInP/GaAs heterojunction bipolar transistors grown by MOCVD

5. Hydrogen in Compound Semiconductors;Zavada,1994

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electrical isolation of InGaP by proton and helium ion irradiation;Journal of Applied Physics;2002-10-15

2. Radiation Damage in GaAs;Radiation Effects in Advanced Semiconductor Materials and Devices;2002

3. Schottky contacts on reactive-ion etched InGaP;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1997-11

4. Passivation of dopants in InGaP using ECR hydrogenation;Materials Science and Engineering: B;1996-04

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