Author:
Müller K.P.,Heinrich F.,Mader H.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference25 articles.
1. Al tapered etching application to submicron multilevel interconnection process;Arikado;IEEE IEDM Tech. Digest'86,1986
2. Plasma etching in magnetic multipole microwave discharge;Arnal;Appl. Phys. Lett.,1984
3. Ethylene Diamine-Pyrocatechol-Water Mixture Shows Etching Anomaly in Boron-Doped Silicon
4. Open stencil masks for ion projection lithography;Buchmann;ESSDERC,1987
5. Pattern fabrication by oblique incidence ion-beam etching;Gokan;J. Vac. Sci. Tech.,1981
Cited by
9 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献