Author:
Stevens L.,Jonckheere R.,Froyen E.,Decoutere S.,Lanneer D.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. L. Stevens, R. Jonckheere, E. Froyen, S. Decoutere, D. Lanneer, to be published.
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5. Beam energy effects in electron beam lithography : the range and intensity of backscattered exposure;Jackel;Appl. Phys. Lett.,1984
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