Electron optical column for high speed nanometric lithography-Reference-Cited by-同舟云学术

Electron optical column for high speed nanometric lithography

Published:1986-12 Issue:1-4 Volume:5 Page:123-131
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Saitou N.,Hosoki S.,Okumura M.,Matsuzaka T.,Matsuoka G.,Ohyama M.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference4 articles.

1. Iwadate K, Yamaguchi R, Hirata K and Harada K, “A Novel High Speed Nanometric Electron Beam Lithography System: EB-F”, to be published in J. Vac. Sci. Technol.

2. A High-speed, High-current Electron Beam Lithography System (Electron Optics);Saitou;J. Vac. Sci. Technol.,1985

3. Ti/W(100) Field Emission Source;Hosoki;XIth Int. Cong. Elec. Microscopy,1986

4. A Simplified Focusing And Deflection System With Vertical Beam Landing;Kuroda;J. Vac. Sci. Technol.,1983

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