Author:
Guillaume M.E.,Livrozet P.,Buevoz J.L.,Alcouffe-Noailly N.
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference4 articles.
1. Fourier Transform Method for Optical Linewidth Measurement;Guillaume;SPIE Vol 480 Integrated Circuit Metrology,1984
2. Evaluation of a Fourier Transform Method for Accurate Critical Dimension Measurements;Guillaume;Microcircuit Engineering,1985
3. D.Courjon, D.Charraut, G.Bou Debs “Modélisation du transfert partiellement cohérent d'objets à transmittance binaire — Application à la microscopie” Annales Opto 87 - Paris mai 87
4. Extension of the MALT concept to thick layers with emphasis on focusing conditions;Guillaume;Microelectronic Engineering,1986
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2 articles.
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1. Critical dimension control of high resolution metal structures by backscattered electrons;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-05
2. Sub-half-micron critical dimension control in x-ray lithography mask technology;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1988-11